Structure via PubChem · Public domain (PubChem)
trimethylsilane
Sign in to saveAlso known as trimethylsilyl hydride
Trimethylsilane is the organosilicon compound with the formula (CH3)3SiH. It is a colorless gas. It is a trialkylsilane. The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane, which is a liquid at room temperature.
In the Vinony graph
Vinony's link graph records 11 inbound references to trimethylsilane, and connects out to mass density, digital object identifier and chemical formula.
It sits within the topics Carbosilanes, Chembox having GHS data and ECHA InfoCard ID from Wikidata.
Vinony links it to 12 Wikipedia language editions.
Chemical data
- Formula
- C3H10Si
- Molecular weight
- 74.2 g/mol
- IUPAC name
- trimethylsilane
- SMILES
- C[SiH](C)C
- InChIKey
- PQDJYEQOELDLCP-UHFFFAOYSA-N
- Polar surface area
- 0 Ų
- H-bond donors
- 0
- H-bond acceptors
- 0
- Formal charge
- 0
via PubChem
Wikidata facts
- Subclass of
- chemical compound
- Has part
- hydrogen
- Mass
- 74.055
Show 3 more facts
- canonical SMILES
- C[SiH](C)C
- chemical formula
- C₃H₁₀Si
- Commons category
- Trimethylsilane
via Wikidata · CC0
~1 min read
Encyclopedic overview
2 sectionsContents
- See also
- References
Trimethylsilane is the organosilicon compound with the formula (CH3)3SiH. It is a colorless gas. It is a trialkylsilane. The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane, which is a liquid at room temperature.
Trimethylsilane is used in the semiconductor industry as precursor to deposit dielectrics and barrier layers via plasma-enhanced chemical vapor deposition (PE-CVD). It is also used a source gas to deposit TiSiCN hard coatings via plasma-enhanced magnetron sputtering (PEMS). It has also been used to deposit silicon carbide hard coatings via low-pressure chemical vapor deposition (LP-CVD) at relatively low temperatures under 1000 °C. It is an expensive gas but safer to use than silane (SiH4); and produces properties in the coatings that cannot be undertaken by multiple source gases containing silicon and carbon.
Excerpted from Wikipedia’s “trimethylsilane” article, available under the CC BY-SA 4.0 licence.